• In Business Since 1982
CANYON MATERIALS, INC.
All-Glass Grayscale Photomasks Enable New Technologies
True Grayscale Photomasks
Services
Photomask

All-Glass Grayscale Photomasks
for the USA and Beyond

CANYON MATERIALS, INC. (CMI) specializes in fabricating true grayscale (not halftone) photomasks used in grayscale photolithography to produce 3D microstructures. The all-glass grayscale photomasks we offer enable mass fabrication of 3D microstructures, such as:

• Refractive Microlens Arrays
• Diffractive Optical Elements (DOE)

• Tapered Structures for Microelectronic and Micromechanical Devices
• Beam-Shaping Elements

Our products also enable the fabrication of apodization filters and various grayscale transmission filters, including single-frequency sinusoidal gratings with zero harmonic distortion. Successful optoelectronic consumer products and medical devices containing key optical elements made using our all-glass grayscale photomask technology have been growing in number on the worldwide market.
Over 40 Years of Industry Experience

Contact us to learn more about our grayscale photomask blanks.

  • 1997 Photonics Circle of Excellence Awardee for HEBS-Glass Photomask Blanks

Overview

CMI’s All-Glass Grayscale Photomask Technologies Include

• HEBS-Glasses and LDW-Glasses

• HEBS-Glass and LDW-Glass Grayscale Photomasks

• Exemplary Utility of the 3D Microstructures

• Method of Making 3D Microstructures Using an All-Glass Grayscale Photomask

Photomasks for Mass Production of Microstructures

Product TypePhoto Tools for Mass Fabrication
2D Microstructures, e.g., IC ChipsChrome on Glass Photomask
3D Microstructures, e.g., MicroopticsHEBS-Glass and LDW-Glass Grayscale Photomasks*
*7 USA patents having 458 patent claims related to HEBS- and LDW-glasses were granted to Che-Kuang (Chuck) Wu and assigned to CMI.

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CANYON MATERIALS, INC.
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