Method of Making 3D Microstructures

The all-glass grayscale photomasks offered by CMI are vital in the mass fabrication of different 3D microstructures. Our creation method follows an easy, 3-step process:

Step 1

Fabricate, e.g., a HEBS-Glass Grayscale Photomask

• E-Beam
• HEBS-Glass (Unexposed)
• HEBS-Glass (Exposed)

Step 2

Photolithography

• UV
• Photomask
• Photoresist
• Substrate
• Developed Photoresist on Substrate

Step 3

Reactive Ion Etching (RIE)

• Reactive Ionic Species
• Photoresist
• Substrate
• Microoptical Element in Substrate

True Grayscale Photomask (A) is Essential for Economic Mass Fabrication of 3D Microstructures (B)

1. HEBS-glass and LDW-glass photomasks enable mass production of 3D microstructures by spatially various exposure on the photoresist.

2. Convert optical density D (x, y) in a mask into designed height H (x, y) in a 3D microstructure.

3. The microlens array shown here has many applications.